Fall 2023 - Chemical Engineering 4420                                    "Fabricating a Semiconductor Diode"

 

 

Week 1 -  Dr. Sergi Lendinez discusses the fundamentals of the fabrication process and reviews the tools students will use to fabricate their devices

 


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Image 1 - Class Orientation

 

 

 

 

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image 2 - Cleanroom Tour



Week 2 - LSU Chemical Engineering Professor/NFF Director, Dr. Kevin McPeak introduced students to the basics of thin film thickness measurement and how Ellipsometry is used to characterize films

 

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Image 1 - Woollam RC2

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Image 2 -  Data collection



Week 3 -  Students began prepping samples for resist coating followed by review of the Quantum ML3Pro which students will use to align  and expose their samples

 

 

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Image 1 - Sample cleaning

 

 

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Image 2 - Resist Application

 

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Image 3 - UV Exposure 



Week 4 - SiO2 layer etched using Oxford Instruments DRIE/ICP followed by resist stripping, Spin On Dopant layer and exposure.

 

 

 

 

 


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Image 1 - Resist stripping/RCA Cleaning

 

 

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Image 2 - Oxide layer removal

 

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Image 4 - Students review first layer application steps

 

 

 

 

 

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Image 3 - First layer exposure



Week 5 -  Students finished processing the first layer of their samples. Dopant layer removed from last week's application followed by microscopic inspection


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Image 1 - HF (SOD Removal)

 

 

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Image 3 - Class review of "Spin on Dopant" etch process

 

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Image 2 - Etch solution prep

 

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Image 4 - Microscopic Inspection



Week 6 -  Students  prepped samples for the second layer application

 

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Image 1 - Sample cleaning

 

 

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Image 2 - RTA ( Rapid Thermal Annealing)

 

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Image 3 - DRIE/ICP Etch

 

 

 

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Image 4 - Alignment inspection



 

Week 7 - Students completed the second layer application. Spincoating followed by a soft bake, second layer exposure and development

 

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Image 1 - Sample Development

 

 

 

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Image 2 - Sample Cleaning

   
 
 
 

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Image 3 - Etching

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Image 4 - "Layer 3"  application discussions



Week 8 - Students applied the final layer to their samples followed by metal layer deposition

  

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Image 1 - Third Layer Etch 

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Image 2 - Sample Development

 

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                                                                                            Image 3 - Microscopic Verification

 

 

 

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Image 4 - Ebeam Deposition Overview

 

 

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Image 5 - Metal Layer Deposition



 

Week 9 -.Students tested their samples for an electrical current then measured the electrical properties by AFM

 

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Image 1 - Probe Station Sample Set Up

 

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Image 4 -  AFM Tip Change

 

 

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Image 2 - Probe Station Class Review

 

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Image 5 - AFM Sample Set-Up

 

c.Image 3 - Electrical Charge Data

 

 

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Image 6 - AFM Scan Review

 

 

 



Week 10 - The final class concluded with students viewing their sample properties by SEM

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Image 1 - SEM sample prep

 

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Image 2 - The Device